![]() ![]() However, nanoscale to microscale variations in structure, composition, and strain within a given nanowire, as well as variations between nanowires, pose challenges to correlating microstructure with device performance. III-As nanowires are candidates for near infrared light emitters and detectors that can be directly integrated onto silicon. The systematic interpretation of nanobeam diffraction patterns from semiconductor heterostructures presents a new opportunity in characterizing and ultimately designing electronic materials. These methods are used to extract the misorientation of lattice planes and the strain of individual layers from synchrotron x-ray nanobeam diffraction patterns of Si/SiGe heterostructures relevant to applications in quantum electronic devices. We report here an extension of coherent xray optical simulations of convergent x-ray beam diffraction patterns to arbitrary x-ray incident angles to allow the nanobeam diffraction patterns of more » complex heterostructures to be simulated faithfully. The scattering of nanofocused x-ray beams from intricate semiconductor heterostructures produces a complex distribution of scattered intensity. X-ray nanobeams exhibit optical coherence combined with a large angular divergence introduced by the x-ray focusing optics. The highly coherent and tightly focused x-ray beams produced by hard x-ray light sources enable the nanoscale characterization of the structure of electronic materials but are accompanied by significant challenges in the interpretation of diffraction and scattering patterns. We report here an extension of coherent x-ray optical simulations of convergent x-ray beam diffraction patterns to arbitrary x-ray incident angles to allow the nanobeam diffraction patterns of more » complex heterostructures to be simulated faithfully. Watson Research Center, Yorktown Heights, NY (United States) OSTI Identifier: 1356646 Alternate Identifier(s): OSTI ID: 1222258 Grant/Contract Number: AC02-06CH11357 ANR-11-BS10-0005 Resource Type: Journal Article: Accepted Manuscript Journal Name: Optics Letters Additional Journal Information: Journal Volume: 40 Journal Issue: 14 Journal ID: ISSN 0146-9592 Publisher: Optical Society of America (OSA) Country of Publication: United States Language: English Subject: 36 MATERIALS SCIENCE Diffractive optics Far field diffraction High numerical aperture optics Ptychography Scanning probe microscopy X ray optics Coherence Synchrotron = , (ANL), Argonne, IL (United States) Aix-Marseille Univ., Marseille (France) Sponsoring Org.: USDOE Office of Science (SC), Basic Energy Sciences (BES) National Agency for Research (ANR) (France) Contributing Org.: Columbia Univ., New York, NY (United States) Thomas J. Publication Date: Research Org.: Argonne National Lab. Watson Research Center, Yorktown Heights, NY (United States). Columbia Univ., New York, NY (United States).Aix-Marseille Univ., Marseille (France). ![]()
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